PLASMACHEMICAL TREATMENT APPARATUS FOR ELECTRONIC DEVICES Russian patent published in 2005 - IPC

FIELD: production of solid state, vacuum-tube, and gas-discharge devices; pumping of gas-discharger lasers.

SUBSTANCE: proposed plasmachemical treatment apparatus incorporates in its structure HF energy supply which is, essentially, distributed-gain amplifier 1 and has controlled current supplies 2, as well as heterogeneous loading waveguide transmission line (anode line) 6 in the form of a number of series-connected low-pass filters 5 and service vessels 10 each incorporating dielectric shell and conducting electrodes 9 that function as plates of capacitor; one of capacitor terminals is connected to output of respective low-pass filter 5 of anode line and other terminal, to common wire. Output terminals of anode line are connected to input terminals of feedback two-port network 7 built of a number of series-connected low-pass filters 8; output of the latter is connected to input terminals of grid line 3 whose output terminals are connected to input terminals of feedback two-port network 11 assembled of a number of series-connected low-pass filters 12; output of two-port network 11 is connected to input terminals of anode line.

EFFECT: enhanced efficiency and reduced cost of apparatus.

1 cl, 3 dwg