METHOD AND DEVICE FOR SIMULATING GAS MIXTURE FLOW IDENTICAL TO OUTLET FLOW OF HF/DF CHEMICAL LASER Russian patent published in 2007 - IPC H01S3/00 

FIELD: laser engineering, supersonic chemical laser gas-dynamic simulators; test finishing and adjustment of pressure recovery system dispensing with laser.

SUBSTANCE: gas-dynamic simulator uses components storage and supply system to feed oxidant and thinner to dynamic mixer wherein components are mixed up and gas mixture obtained is conveyed to injector head of gas producer. Then mixture is passed to combustion chamber wherein its parameters are brought to values identical to spent active medium of HF/DF supersonic chemical laser. Gas mixture flow is conveyed to supersonic service nozzle in transition section. After that gas mixture flow is fed from supersonic service nozzle to branch pipe. Predetermined pressure P_ts is maintained within transition section. Gas-dynamic simulator is provided with branch pipe installed between supersonic service nozzle and transition section, and with grid in the form of perforated plate installed between transition section and nozzle-assembly precombustion chamber.

EFFECT: enhanced uniformity of distributing gas mixture flow parameters through simulator outlet sectional area, minimized size of device.

2 cl, 1 dwg