NONSTECHIOMETRIC CERAMIC TARGET MADE OUT OF THE NICKEL OXIDE Russian patent published in 2007 - IPC C23C14/08 C23C14/34 C04B35/01 G02F1/15 

FIELD: chemical industry; ceramic industry; other industries; production of the ceramic targets intended for usage at deposition of the films in the spraying installations.

SUBSTANCE: the invention is pertaining to the ceramic targets intended for usage at deposition of the films in the spraying installations, in particular, at the magnetron spraying. The invention presents the ceramic target on the basis of the nickel oxide (NiO_x), in which the share of oxygen is less than in nickel oxide corresponding to the stoichiometric composition. This ceramic target is used for production of the thin layer on the basis of - the nickel oxide. The electrochemical device contains, at least, one substrate, on which the block of the functional layers has been formed, which -contains, at least, one electrochemically active layer. The electrochemical active layer is capable reversibly and simultaneously include the ions Н⁺, Li⁺ or OH^- and electrons. At that the layer may be alloyed with element, which oxide is electroactive substance at the anodic staining, selected from Co, Ir, Ru and Rh or of the mixture of these elements-. The layer may be alloyed with the element, which oxide is - electroactive substance at the cathodic staining, selected from Mo, W, Re, Sn, In and Bi or of the mixture of the indicated elements. The layer may be alloyed with the element selected from elements of the first group of the Periodic Table of the elements, in particular, selected from Н, Li, K and Na or of the mixture of the indicated elements; or selected from Ta, Zn, Zr, Al, Si, Sb, U, Be, Mg, Ca, V and Y or of the mixture of these elements. The presented target allows to manufacture the electrochemical devices with the capability of adjusting of the parameters- of the deposited film, in particular, its optical transmission.

EFFECT: the invention allows to manufacture the electrochemical devices with the capability of adjusting of the parameters- of the deposited film, in particular, its optical transmission.

23 cl, 2 dwg, 1 tbl, 2 ex