ETCHING SOLUTION Russian patent published in 2008 - IPC C03C15/00 C09K13/06 

Abstract RU 2323181 C1

FIELD: glass industry.

SUBSTANCE: proposed etching solution contains the following components: HF, HNO3, NH4F, H2O and additionally it contains glycerin CH2OHCHOHCH2OH at the following ratio of components, mass-%: HF, 20.0-24.0; HNO3, 12.0-16.0; NH4F, 14.0-18.0; CH2OHCHOHCH2OH, 0.5-1.5; the remainder being H2O.

EFFECT: increased depth of etching glass with no distortion in pattern.

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RU 2 323 181 C1

Authors

Shchepochkina Julija Alekseevna

Dates

2008-04-27Published

2006-08-03Filed