ETCHING SOLUTION Russian patent published in 2008 - IPC C03C15/00 

Abstract RU 2338709 C2

FIELD: chemistry.

SUBSTANCE: etching solution contains HF, H2SO4, glycerine and K2Cr2O7, with the following ratios of components, in wt %: HF - 55.0 - 65.0; H2SO4 - 27.0-32.0; glycerine -2.0-3.0; K2Cr2O7 - 5.0-10.0.

EFFECT: faster etching of glass.

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RU 2 338 709 C2

Authors

Shchepochkina Julija Alekseevna

Dates

2008-11-20Published

2006-12-25Filed