ETCHING SOLUTION Russian patent published in 1994 - IPC

FIELD: glass treatment. SUBSTANCE: the etching solution comprises HF, NH₄F and K₂CO₃ and further comprises NaCl and HNO₃, the ratio of the components being as follows (wt % ): 50.0-60.0 HF; 20.0-30.0 NH₄F; 8.0-10.0 K₂CO₃; 3.5-4.5 NaCl; and 6.0-7.5 HNO₃. The use of the etching solution makes it possible to increase the glass treatment rate to 0.05-0.055 micron/S. EFFECT: improved properties of the glass. 1 tbl