PHOTOSENSITIVE RESIN FOR PRINTING MATRIX ENGRAVED BY LASER Russian patent published in 2008 - IPC G03F7/04 B41N1/12 G03F7/75 B41C1/05 

FIELD: physics.

SUBSTANCE: invention pertains to a printing matrix engraved by a laser, used for obtaining a relief image using known methods. Description is given of the printing matrix engraved by a laser, obtained through photocuring a compound on a photosensitive resin base (a), consisting of a polymerised unsaturated group and which has an average molecular mass between 1000 to 20 x 10⁴, an organic compound (b), with a polymerised unsaturated group and average molecular mass less than 1000 and an organic silicon compound (c), with at least, one Si-O bond and not containing a polymerised unsaturated group. Content of the organic silicon compound (c), lies in the range from 0.1 to 10 % of the mass of the compound on the photosensitive resin base. Description is given of obtaining the printing matrix engraved by a laser, through formation of the given compound on a canvas or cylinder with subsequent linking and solidification under exposure to light.

EFFECT: increased resistance of the printing matrix to abrasion and to adhesion on its surface.

19 cl, 2 tbl, 12 ex