FIELD: physics.
SUBSTANCE: remote method for measurement of thin film thickness on material surface consists in the fact that material surface is radiated by optical radiation in lengths of probing waves λ1, λ2, λ3, λ4, signal reflected from surface is registered, and film thickness d is defined by results of analysis of dependence of reflected signal intensity in lengths of probing waves λ1, λ2, λ3, λ4, at that lengths of probing waves λ1, λ2, λ4 are selected so that λ1=λ2-Δλ, λ3=λ2+Δλ, Δλ is selected so that to provide for inequality 
where n2 is thin film refraction index, and length of probing wave λ4 is selected based on condition
EFFECT: provision of stable operation of method for measurement of thin film thickness in real conditions, when measurement noise makes units of percents.
3 dwg
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