PLASMATRON Russian patent published in 2009 - IPC H05H1/26 

Abstract RU 2363119 C2

FIELD: mechanical engineering.

SUBSTANCE: invention relates to mechanical engineering, more specifically - to devices, generating plasma for heating and treatment of different product's surfaces, for treatment of nonconductivity material, and can be used in mechanical engineering for tempering, annealing, surface treatment, sputtering and hardening of products. Plasmatron contains body, two unlocked electrodes with corresponding current-tapping ends and channel for feeding of plasma-forming gas. Each electrode is implemented of curved shape, enveloping section of treated surface, herewith electrodes are located parallel to each other.

EFFECT: usage of invention will provide to increase rate and evenness during treatment of extended (long-length) products with nonplanar (curvilinear) external or internal surface, with providing of operation excluding power supply protection against high-voltage voltage of permanently operating oscillator and ability to work as on constant, as on alternating current.

12 cl, 8 dwg

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RU 2 363 119 C2

Authors

Israfilov Irek Khusnemardanovich

Israfilov Zagir Khusnimardanovich

Israfilov Danis Irekovich

Galiakbarov Azat Talgatovich

Dates

2009-07-27Published

2006-07-03Filed