ARRANGEMENT OF ALTERNATING CURRENT PULSE PLASMA SOURCE Russian patent published in 2015 - IPC H05H1/24 

FIELD: electricity.

SUBSTANCE: invention is referred to devices intended for the production of low-temperature pulse plasma and may be used in plasma chemistry, machine building and for experimental researches. The device comprises a chamber for the pre-treatment of plasma-supporting gas with the distribution of the flow to a narrowed nozzle inlet in order to generate a laminar jet of the plasma-supporting gas. The nozzle is perforated and forms an inner channel with a variable cross section guiding the jet directly to the electrodes surface. There are four additional tangential outputs forming the gas laminar jet directly at the electrodes surface, an auxiliary pulse source of arcing start-up; electrodes of metal water-cooled tubes on insulators diverging at an angle of 2° are faced with their rounded end surfaces towards the output of the plasma jet. The inner channel of this device is completed with a water-cooled nozzle compressing the plasma jet directed to a processed article.

EFFECT: increased productivity and reduced own costs of processing for technologies of the surface application of different materials without volumetric heating and deformation and plasma stripping of treated surfaces that allows eliminating the corrosion layer.

2 dwg