FIELD: test equipment.
SUBSTANCE: invention refers to analysis of the quantity of impurities in carbon dioxide during manufacturing and/or cleaning process. Measurement method of concentration of impurities during gas cleaning consists in the fact that, first, gas flow containing impurities passes through gas absorbing device during the time period at ambient temperature or higher so that impurities can be absorbed. Than gas flow movement is stopped. Then, desorption and analysis of impurities in stopped gas flow movement is performed by means of detector. At that, impurities have been chosen from the group consisting of H2S, COS, dimethyl sulphide, benzene, aldehydes, spirits with low length of carbon chain and hydrocarbons. Also, in the proposed method, gas absorbing device includes column with absorbent layer in gas chromatograph, and gas is desorbed from column with absorbent layer through gas-distributing column.
EFFECT: improving accuracy and reducing costs for measurement of concentration of impurities during gas cleaning.
9 cl, 1 dwg
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