FIELD: process engineering.
SUBSTANCE: invention relates to application of dielectric powder on substrates arranged in process chamber with whatever controlled atmosphere at pressure varying from deep vacuum to that above atmospheric pressure. Proposed device comprises fixed housing with inlet and outlet branch pipes, triboelectrising disk with axial hole and working stock channels arranged in said housing. Working channels communicate with axial hole, inlet and outlet branch pipes. Disk faces accommodate triboelectrising plates with through holes made above disk channels to remove static electricity, earthed conducting plates being arranged on said triboelectrolising disks. Disk is fitted on driven shaft with clearance to revolve thereon. Radial disk channels form flat sectors. Housing inner surface represents, at the disk level, a triboelectrising ring. Through cutouts are made in each sector of the disk and aforesaid plates to accommodate conducting inserts to stay in contact with conducting plates. Holes to remove static electricity are made on all triboelectrising surfaces in contact with stock. Note here that the gap between housing inner surface and disk receives wedge-like blade extending over entire length of radial plane of sectors. Flap is arranged in housing, at the point it communicated with branch pipe, to periodically communicate disk channels with outlet branch pipe. Note also that disk shaft and housing are earthed via HV conductor.
EFFECT: no need to use carrier gas at factor of stock sticking to substrate not exceeding unity.
2 cl, 3 dwg
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Authors
Dates
2011-05-10—Published
2009-11-09—Filed