METHOD FOR OBTAINING SPUTTERING TARGET FROM ALUMINIUM-BASED ALLOY Russian patent published in 2012 - IPC C23C14/34 C22C21/00 C22C1/02 

FIELD: metallurgy.

SUBSTANCE: aluminium is molten, molten metal is brought to overheated homogeneous state at temperature of 1150°C. Stannum, indium and bismuth is added; melt temperature is brought to temperature of up to 1150°C; exposure is performed at this temperature. Then, lead and copper is added so that alloy can be obtained with the composition, wt %: lead 13.5, stannum 4.5, copper 0.5, indium 1.0, bismuth 1.3, aluminium 79.2 or with the following composition, wt %: lead 15.4, stannum 5.0, copper 1.0, indium 0.5, bismuth 1.0, aluminium 77.1 or with the following composition, wt %: lead 13.2, stannum 5.5, copper 1.4, indium 1.5, bismuth 0.5, aluminium 77.9, melt is mixed and exposed at temperature of 1150°C. After that, melt is drained to spray-type melting pot and sprayed with argon till the powder that is compacted and rolled till the plate is produced is obtained, and sputtering target is made from it.

EFFECT: producing the target allowing to obtain thin working layers on treated items and providing improved running-in ability and scoring resistance of working layers without reducing the strength and wear resistance.

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