FIELD: process engineering.
SUBSTANCE: invention relates to method of removing contaminant drops from gas flow and to rinsing chute. Said chute comprises, at least, one device with swirl tube. Gas flow with drops of contaminant is fed into said swirl tube. Rinsing fluid is fed into gas flow. Said fluid is fed into, at least, one swirl tube to make gas/fluid mix wherein rinsing fluid drops are dispersed in gas flow. Rinsing fluid drops and contaminant drops are brought in contact to interact in cleaning section. Said gas/fluid mix is forced along swirling means for centrifugal separation of said mix into clean gas and fluid to be withdrawn therefrom. Rinsing chute with swirl tubes comprises means to feed rinsing fluid including outlet located at definite distance above fluid feed area.
EFFECT: efficient separation of contaminant drops.
10 cl, 4 dwg
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Authors
Dates
2013-02-20—Published
2008-07-02—Filed