FIELD: metallurgy.
SUBSTANCE: method is intended for electroexplosive sputtering of a coating of TiB2-Cu system on copper contact surfaces. Inside two-layer foil from copper there arranged is a powder charge from titanium diboride. Electric explosion of foil is performed so that a pulse multiphase plasma jet is formed. Contact copper surface is fused at the value of absorbed power density of 4.5…5.0 GW/m2 and the fused layer is saturated with components of the plasma jet. Then, self-hardening and formation of a composite coating containing titanium diboride and copper is performed.
EFFECT: obtaining a pore-free coating with a base at cohesion level, which has high electroerosion resistance.
4 dwg, 2 ex
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