FIELD: physics.
SUBSTANCE: present invention is an exposure device for exposing a photo-aligned film disposed on a substrate. The exposure device includes a light source and a photomask and exposes the photo-aligned film through the photomask, while scanning the light source or the substrate. When the direction in which the light source or substrate is scanned is selected as the scanning direction, and the direction which is orthogonal to the scanning direction is selected as the vertical direction, the photomask includes a first region and a second region which borders the first region in the vertical direction. The first region includes a plurality of first transparent parts inside a second light-protective part. The plurality of first transparent parts is arranged in the vertical direction. The second region includes a plurality of second transparent parts inside the second light-protective part. The plurality of second transparent parts is less than the plurality of first transparent parts. The plurality of second transparent parts is arranged in the vertical direction and is discretely dispersed in the scanning direction.
EFFECT: providing an exposure device which can prevent visual recognition of unevenness of display on the interface area, even if scanning is temporarily stopped during scanning exposure.
28 cl, 21 dwg
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Authors
Dates
2014-03-10—Published
2010-10-29—Filed