FIELD: physics.
SUBSTANCE: lithographic machine comprises a projection lens system (132) for focusing one or more exposure beams on a target, a movable table (134) for moving the target (9), a capacitive measurement system (300) for taking measurements associated with distance between the last focusing element (104) of the projection lens system and the surface of the target (9), and a control unit (400) for controlling movement of the movable table (134) for adjusting the position of the target (9) partly based on the signal from the capacitive measurement system. The capacitive measurement system (300) comprises a plurality of capacitive sensors (30), each having a thin-film structure. The capacitive sensors and the last focusing element (104) of the projection lens system are mounted directly on a common base (112), and the sensors are situated in the immediate proximity to the edge of the last focusing element of the projection lens.
EFFECT: high resolution and accuracy of the lithographic machine.
16 cl, 32 dwg
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Authors
Dates
2014-11-10—Published
2010-12-29—Filed