FIELD: process engineering.
SUBSTANCE: proposed microstructures can be used for protection of documents against counterfeit. Replication of relief microstructures that form the pattern comprises the steps that follow. Making of first ply (21) with surface microstructure to produce pattern on second ply (22). Note here that first ply comprises first material while second ply comprises second material. Production of matrix including copying of first ply microstructure in second ply at one etching step. Note also that first ply first material and second ply (22) second material as well as etching conditions are selected to that etching rate of second ply (22) exceeds that of first ply (21). Matrix microstructure is brought in contact with image material for matrix microstructure to be reproduced in image material with surface relief profile reversed relative to matrix surface relief profile.
EFFECT: simplified duplication.
21 cl, 24 dwg
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