FIELD: chemistry.
SUBSTANCE: polishing composition contains water suspension of polishing powder - polirite and polyoxyalkyleneglycol as defoaming additive, with the following component ration, wt %: polyoxyalkyleneglycol 0.01-0.03; water suspension of polishing powder counted per 10% suspension - the remaining part.
EFFECT: invention makes it possible to increase time of continuous work of polishing machines.
6 tbl
Title | Year | Author | Number |
---|---|---|---|
POLISHING SUSPENSION | 2017 |
|
RU2655902C1 |
POLISHING COMPOSITION | 0 |
|
SU1014872A1 |
0 |
|
SU487922A1 | |
METHOD OF PREPARING CONCENTRATED MODIFIED POLISHING SUSPENSION | 2003 |
|
RU2246518C2 |
METHOD OF PRODUCING POLISH POWDER | 0 |
|
SU1047944A1 |
COMPOSITION FOR ASSOCIATED POLISHING TOOL | 2013 |
|
RU2526982C1 |
METHOD OF PRODUCING POLISHING POWDER | 0 |
|
SU920060A1 |
DIAMOND-ABRASIVE COMPOSITION FOR POLISHING BORATE GLASS | 0 |
|
SU563006A1 |
METHOD OF PRODUCING SUSPENSION FOR POLISHING OPTICAL GLASS | 0 |
|
SU1249045A1 |
OPTICAL GLASS POLISHING COMPOSITION | 2018 |
|
RU2686923C1 |
Authors
Dates
2015-02-10—Published
2013-06-25—Filed