PHOTOPOLYMER FORMULATIONS WITH ADJUSTABLE MECHANICAL MODULUS GUV Russian patent published in 2015 - IPC G11B7/24 G11B7/245 G03F7/27 G03H1/00 C08G18/00 

FIELD: chemistry.

SUBSTANCE: invention relates to method of manufacturing exposed holographic media. The holographic medium contains a photopolymer formulation with adjustable mechanical modulus G_UV in the range from 0.1 to 160 MPa and Δn≥0.008. The method includes: i. preparation of a photopolymer formulation, including A) matrix polymers in form of amorphous network, B) combination of one monofunctional recording monomer and one multifunctional recording monomer, C) photoinitiating system, D) optionally component, unable of photopolymerisation, E) if necessary catalysts, stabilisers of radicals, solvents, additives, as well as other auxiliary and/or additional substances; ii. shaping photopolymer formulation as a medium; iii. carrying out experiment on holographic exposure on media in order to record hologram, and iv. illumination of the entire medium with UV-radiation in order to fix hologram. Recording monomers represent compounds with acrylate and/or methacrylate functional groups. The total content of recording monomers in photopolymer formulation constitutes not less than 30 wt % and not more than 45 wt %. Non-exposed photopolymer formulation has modulus G₀<0.7 MPa, with G_UV modulus of exposed photopolymer composition via ratio of relative part of monofunctional recording monomer to relative part of multifunctional recording monomer in the total content of recording monomers is adjusted in covered area from 0.1 to 160 MPa in such a way that high modulus is provided by means of high relative part of multifunctional recording monomer, and low modulus - by means of high relative part of monofunctional recording monomer in the total content of recording monomers.

EFFECT: obtaining holographic media with G_UV variable between 0,1 and 160 MPa and Δn index not lower than 0,008.

16 cl, 4 tbl, 17 dwg