FIELD: process engineering.
SUBSTANCE: invention relates to solid-state electronics, particularly, to fabrication of photo conducting radiation-resistant structures. This process comprises pre-formation of monoply of fat acid on the surface of lead-bearing salt solution in water in concentration of 1·10-3-5·10-3 mol/l to get said monoply by Langmuir- Blodgett process. Said one lead-bearing fat acid monoply is applied on photosensitive film surface. Said film is subjected to thermal sensitization. Note here that monoply transfer on photosensitive ply is performed by Langmuir- Blodgett process after said thermal sensitization. Pre-formation of monoply of fat acid is executed on the surface of lead-bearing salt solution in water at solution pH of 8.0±0.4.
EFFECT: higher radiation-resistance at high photo sensitivity and wide spectral range of photo sensitivity.
3 cl, 5 dwg, 6 tbl, 3 ex
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