TUNNEL DEVICE MANUFACTURING PROCESS Russian patent published in 1998 - IPC

Abstract RU 2106041 C1

FIELD: nanoelectronics and computer engineering; single-electron logic and storage circuits operating at room temperature. SUBSTANCE: first, second, and n-th gate electrodes are formed on atomically smooth surface of solid-state substrate followed by formation of inert dielectric molecular matrix electrically insulated from solid-state substrate surface and having embedded active molecules and clusters that function as centers of location of tunnelling electrons thereby forming single-electron tunnel junctions. EFFECT: enlarged functional capabilities. 3 cl, 2 dwg

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RU 2 106 041 C1

Authors

Gubin Sergej Pavlovich[Ru]

Kolesov Vladimir Vladimirovich[Ru]

Soldatov Evgenij Sergeevich[Ru]

Trifonov Artem Sergeevich[Ru]

Khanin Vladimir Viktorovich[Ru]

Khomutov Gennadij Borisovich[Ru]

Jakovenko Sergej Aleksandrovich[Ru]

Dates

1998-02-27Published

1996-06-21Filed