VORTEX CHAMBER FOR GAS AND FLUID CONTACT Russian patent published in 2015 - IPC B01D47/06 

FIELD: process engineering.

SUBSTANCE: invention relates to direct contact between gas and fluid. Vortex chamber for contact of gas with fluid with feed means has gas discharge distributed over chamber side surface and provided with gas swirler while gas discharge means is located there inside. In compliance with this invention, said spinning device abuts on gas swirler or built therein to make fluid outlet from vortex chamber. The simplest version of spinning device is composed of one- or multistart volute composed of one or several spiral shells (opening along the flow) with ends overlapping in radius. Areas of overlapping make tangential slits for fluid discharge from the chamber. Spinning device inner radius approximates to maximum radius of gas swirler inner surface while fluid outlet is composed of one or several tangential slits communicating vortex chamber with its gas inlet.

EFFECT: higher efficiency and reliability, decreased overall dimensions.

2 cl, 2 dwg