FIELD: process engineering.
SUBSTANCE: invention relates to thermal and chemical-thermal processing and can be used in machine building, etc. Proposed process comprises nitride hardening followed by annealing. Nitride hardening is executed in vacuum chamber in gas mix of 15 wt % of nitrogen and 85 wt % of argon at 650-700°C by vacuum heating in high-density plasma with the effect of hollow cathode. Said high-density plasma is generated between the part and perforated shield made of titanium alloy. Then, vacuum diffusion annealing is performed in argon at 800-850°C.
EFFECT: higher hardness and contact wear-resistance at lower working pressure and decreased holding interval.
3 dwg, 1 ex
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Authors
Dates
2015-07-27—Published
2014-05-21—Filed