FIELD: chemistry.
SUBSTANCE: invention relates to equipment for carrying out adsorption processes in gas(steam) - adsorbent system. Adsorbent, for instance, for vertical adsorber, which contains cylindrical case with cover and bottom, with mounted in cover charging port, union for supply of initial mixture with distribution mesh, union for discharge of vapours in desorption and union for safety valve, with stiffening ring being provided in the place of contact of cover and case, and in the middle part of case on support ring installed are bars with supports, supporting grate, on which a layer of gravel is laid, with adsorbent layer being placed between layer of gravel and mesh, on which loads are placed to prevent adsorbent from being taken away in the process of desorption, discharge of waste adsorbent is realised through discharge port, installed in case, with bubbler and inspection hatch with union for condensate output and water supply being mounted in bottom; bubbler is made toroid-shaped and is fixed on conic surface of bottom by means of spacers, with coefficient of bubbler toroidal surface perforation being in optimal interval of values: K=0.5…0.9, and union for discharge of purified gas being located on conic bottom surface, with adsorption and desorption processes occurring at the following optimal ratios of apparatus-composing elements: ratio of height H of cylindrical case part to its diameter D is in optimal ratio of values: H/D=0.73…1.1; ratio of height H of cylindrical part of case to thickness S of its wall is in optimal ratio of values: H/S=220…275; ratio of adsorbent layer height H1 to height H of cylindrical part of case is in optimal ratio of values: H1/H=0.22…0.55; ratio of adsorbent layer height H1 to height H2 of gravel layer is in optimal ratio of values: H1/H2=5.0…12.0, with adsorbent being made in shape of cylindrical ring, to lateral surface of which opposite to each other glued are two hemispherical surfaces in such a way that diametrical planes of hemispheres match respectively upper and lower bases of cylindrical ring, and apexes of hemispherical surfaces are on ring axis and are directed towards each other.
EFFECT: increased degree of gas flow purification from target component and dust due to increased area of contact of adsorbent with target component.
9 dwg
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Authors
Dates
2015-12-10—Published
2014-01-20—Filed