FIELD: technological processes.
SUBSTANCE: invention relates to production of high-temperature resistance radioparent materials. Method includes finishing quartz fabric with organosilicon resin, impregnation with a mixture chromium-aluminophosphate ligament and fine powder of alumina, placing on rigid mandrel a package with a given number of layers of quartz fabric. On surface of assembled package a 0.5-5.0 mm thick layer is applied from a mixture of chromium-aluminophosphate binder and an aqueous slurry of quartz glass of polydisperse composition from 0.1 to 500 mcm, wherein amount of solid phase in an aqueous slurry of quartz glass is equal to percentage composition of quartz fabric in package. Hardened and pressed simultaneously with pumping of water vapour and volatile, heat treated at temperature 350±5 °C for 1-2 hours. Then method includes impregnation with a mixture of sediment of aqueous slurry of quartz glass with particle size of not more than 1.0 mcm and silica sol in ratio 1:1, drying and heat treatment at temperature 350±5 °C for 1-2 hours.
EFFECT: protection of glass fabric from thermal decomposition, providing dielectric and strength characteristics of material in modes of one-sided heating to 1,200 °C at a rate of 100 degrees/s and higher and possibility of obtaining complex products without destruction of reinforcement mesh.
1 cl, 1 tbl, 3 ex
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Authors
Dates
2016-09-10—Published
2015-08-03—Filed