FIELD: separation; mixing.
SUBSTANCE: invention relates to device for the substrates exposure to the ultraviolet (UV) radiation in the field of application and can be used in various fields of industry. Device for the substrates exposure to the UV radiation in the application area contains: radiation source, which emits the UV radiation, as well as visible light and infrared radiation in some spatial angle, and radiation-selective deflection mirror, which reflects most of the UV radiation and transmits most of the visible light and IR radiation. Deflecting mirror comprises at least two flat mirror strips, which are inclined relative to each other so, that they reflect the divergent direct radiation from the radiation source towards the application zone, and thereby at least reduce the divergence, and hence lead to increase in the surface intensity in the application zone. Technical result of the invention is significant increase in the UV radiation desired intensity in the application area without significant increase in the VL and IR radiation undesired intensity.
EFFECT: UV-sensitive varnish curing stage can be made shorter, and therefore, with the increased clock frequency, more products per unit of time can be cured, cost and energy consumption can be reduced.
6 cl, 11 dwg
