FIELD: physics; chemistry.
SUBSTANCE: invention relates to film-forming for photoresists based on alkylphenol-formaldehyde resins. Film-forming component for alkylphenol-formaldehyde resin based photoresists is obtained by condensation of an alkylphenol mixture and formaldehyde in the presence of benzenesulfonic acid as an acid catalyst in an acetic acid medium as an organic solvent when heated, followed by separation of the resin to 5–10 °C cooled distilled water, coke-chemical fractions dicresol and tricresol are used as monomers, the monomer/formaldehyde molar ratio is 1/(0.57–1).
EFFECT: technical result is the expansion of the raw material base for the synthesis of the film-forming component.
1 cl, 2 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD FOR PREPARING NOVOLAC ALKYL-PHENOL-FORMALDEHYDE RESIN | 0 |
|
SU1786041A1 |
| POSITIVE PHOTORESIST | 0 |
|
SU1068879A1 |
| THERMOSETTING, INFRARED ABSORBING POLYMERS AND USE THEREOF IN HEAT-SENSITIVE OFFSET PRINTING PLATE | 2005 |
|
RU2387676C2 |
| 0 |
|
SU26441A1 | |
| NEGATIVE PHOTORESIST FOR "EXPLOSIVE" PHOTOLITHOGRAPHY | 2017 |
|
RU2648048C1 |
| 0 |
|
SU478843A1 | |
| METHOD OF PRODUCING POSITIVE PHOTORESIST | 2010 |
|
RU2427016C1 |
| PROCESS FOR PREPARING NOVOLAC PHENOL FORMALDEHYDE RESINS | 1992 |
|
RU2039763C1 |
| METHOD OF PRODUCING PHENOLFORMALDEHYDE RESIN | 0 |
|
SU1073244A1 |
| METHOD OF PRODUCING NEGATIVE PICTURE ON POSITIVE PHOTORESISTOR | 0 |
|
SU1109708A1 |
