FIELD: technological processes.
SUBSTANCE: invention relates to photoresist compositions and can be used in electron-beam lithography, in X-ray lithography in production of integrated circuits with submicron dimensions of elements. Photoresistive composition of the high-sensitivity positive electronic resistor contains a polymethylmethacrylate polymer and a solvent; the polymethylmethacrylate polymer has a molecular weight of 200,000–500,000. Polymer and solvent are taken in ratio, wt%: polymethyl methacrylate polymer – 5–15, solvent – the rest, wherein polymethylmethacrylate polymer is obtained by polymerisation of methyl methacrylate, methacrylic acid and butylacrylate, which are taken in the following ratio, wt%: methyl methacrylate – 70–90, methacrylic acid – 5–15, butylacrylate – from 5–15.
EFFECT: high sensitivity of the electronic device.
1 cl, 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| COMPOSITION FOR PREPARING POSITIVE ELECTRONIC- AND ROENTGEN-RESIST | 1992 |
|
RU2044340C1 |
| PRODUCTS MADE OF POLYMETHYLMETHACRYLATE MOULDING COMPOUND | 2003 |
|
RU2334765C2 |
| ADVERSE WEATHER CONDITIONS RESISTANT FILM FOR COLOURING REFLECTIVE MOULDED ARTICLES YELLOW | 2005 |
|
RU2393178C2 |
| POLYMERIC COMPOSITION | 1993 |
|
RU2054022C1 |
| PHOTOPOLYMERIZING COMPOSITION FOR MANUFACTURE OF FLEXIBLE PHOTOPOLYMER PRINTING PLATES | 1994 |
|
RU2114454C1 |
| COMPOSITION FOR TREATING KERATINOUS MATERIALS CONTAINING AT LEAST ONE ORGANOSILICON GRAFTED COPOLYMER WITH POLYSYLOXANE SKELETON HAVING GRAFTED ORGANIC MONOMERS CONTAINING NO SILICON AND AT LEAST ONE ANION POLYMER | 1996 |
|
RU2166926C2 |
| SCRATCH-SAFE REAR PROJECTION SCREEN AND METHOD FOR ITS MANUFACTURE | 2004 |
|
RU2343521C2 |
| COMPOSITION FOR GLUING THERMOPLASTS | 1989 |
|
SU1609117A1 |
| METHOD OF OBTAINING TRIBLOCKCOPOLYMERS OF METHACRYLIC MONOMERS | 2013 |
|
RU2537002C1 |
| IMPROVED PROPERTIES OF FOAMED POLYMETHYL METHACRYLATES BY USING METHACRYLAMIDES | 2017 |
|
RU2741814C2 |
