FIELD: purification of industrial plants.
SUBSTANCE: invention relates to a cleaning composition for removing organic deposits. Described is a cleaning composition for removing organic deposits, wherein the cleaning composition contains: a first salt having structure (B) and a second salt having structure (A):
,
where R1, R2 and R3 independently represent C4-C12 aliphatic groups; n and m are independently 1 or 2; and X and Y are independently selected from ammonium and hydroxyalkylammonium; and hydrocarbon solvent.
EFFECT: technical result is improved cleaning of industrial plants to solve one or more problems associated with known approaches.
14 cl, 2 dwg, 3 tbl, 20 ex
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