FIELD: medical equipment.
SUBSTANCE: invention can be used in X-ray microscopy methods, high-resolution tomography, spectroscopy, fluorescence spectrometry for solving problems requiring focusing, collimation or collection of X-ray radiation. It is achieved by the fact that by the two-photon lithography method by applying a photoresist to the substrate with its subsequent exposure, the structure is printed with focused laser radiation in the two-photon lithography mode and the exposed structure is developed. After development, high-temperature annealing of the structure is carried out in an inert atmosphere, for which it is heated to the annealing temperature, holding and cooling. In this case, heating and cooling are carried out at a rate not exceeding 30°C/min.
EFFECT: decrease in the focal length of an X-ray lens with a decrease in its geometric dimensions due to the provision of lens shrinkage during pyrolysis, with a decrease in the radius of curvature of the working surface of the lens, as well as an increase in lens resistance to X-ray radiation.
4 cl, 5 dwg, 2 tbl, 1 ex
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Authors
Dates
2021-09-28—Published
2020-12-31—Filed