FIELD: nanotechnology.
SUBSTANCE: technique of application of nano-pattern uses the near-field photolithography, which provides a substrate with a layer sensitive to radiation, a rotatable mask having a nano-pattern on the outer surface, contact of the said nano-pattern with the said layer sensitive to radiation, the distribution of radiation through the said nano-pattern while rotating the said mask on the said layer sensitive to radiation, thereby an image is created having a size of the element in the range of less than 1 micron to about 1 nm in the said layer sensitive to radiation, and the said nano-pattern is able to be conformal nano-pattern which is consistent with the said layer sensitive to radiation on the surface of the said substrate.
EFFECT: creation of nano-patterns on substrates of a large area.
30 cl, 8 dwg
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| METHOD OF MANUFACTURE OF TEMPLATE | 0 |
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SU1788532A1 |
