METHOD FOR GAS-PHASE DEPOSITION OF TANTALUM CARBIDE ON THE SURFACE OF PRODUCTS Russian patent published in 2021 - IPC C23C16/32 C23C16/455 

FIELD: nanotechnology.

SUBSTANCE: invention relates to a method for gas-phase deposition of coatings of tantalum carbides on the surface of the product and can be used to create protective coatings with high hardness, resistance to erosion and ablation, for example, on graphite products and carbon-carbon composites in combustion chambers and nozzles of aircraft engines, to create wear-resistant hard coatings and coatings with high antifriction properties, for coatings that play the role of a diffusion barrier for oxygen and other elements in microelectronics products, in such as a gate electrode in n-type oxide-metal-semiconductor structures, for coatings accumulating solar energy and solar cells promising for manufacturing. The method for gas-phase deposition of tantalum carbides on the surface of the product includes the supply of tantalum halide vapors, carbon halide vapors and reducing metal vapors to the surface of the product. Vapors of these substances are transported in streams of inert carrier gases through various channels to the surface of the product. When tantalum carbides are deposited on the surface of the product near the surface, the reagents are mixed with the elemental composition of the mixture with the ratios Ta/C from 0.1 to 10 and Me/(G1+G2) from 0.1 to 10 and heating of reagents to temperatures of 850-1400 K, while Me is a reducing metal, G1 is a halogen used in Ta halide, G2 is a halogen used in carbon halide.

EFFECT: deposition of a coating of tantalum carbides on the surface of products is ensured at lower deposition temperatures, with reduced requirements to the equipment used and increased safety of deposition processes to obtain coatings of improved quality.

5 cl, 1 dwg