METHOD AND DEVICE FOR CLEANING SUBSTRATE AND COMPUTER SOFTWARE PRODUCT Russian patent published in 2022 - IPC G03F1/82 B08B7/00 

FIELD: cleaning devices.

SUBSTANCE: invention relates to methods for cleaning substrate. A method for cleaning substrate includes scanning with laser radiation of a surface with residues, heating the specified surface and residues. The heating is adjusted in such a way that, as a result of heating, firstly, part of residues is melted, so that the melted part of residues begins to flow to the solid part of residues, forming a convex-concave section, due to which a thicker layer of residues created in such a way absorbs additional heat to decompose or evaporate them. Scanning with laser radiation includes multiple movement of laser radiation back and forth in the first direction with the first scanning speed, while laser radiation is simultaneously moved in the second direction perpendicular to the first direction with the second scanning speed. The first scanning speed is high and exceeds the second scanning speed, and the second speed is low, so that the convex-concave section is moved in the second direction. A device for implementing the method for cleaning substrate and a computer-readable information carrier are also disclosed.

EFFECT: increase in the efficiency of substrate cleaning.

12 cl, 11 dwg