INDUCTOR FOR HIGH-FREQUENCY PLASMATRON (OPTIONS) Russian patent published in 2022 - IPC H05H1/26 H05H1/30 H05H1/46 B23K10/00 

FIELD: metallurgy.

SUBSTANCE: invention relates to devices for the production and control of plasma in heating of gas flows in plasma-chemical, metallurgical, and other processes. The production of inductively coupled plasma is performed using an inductor according to its first option, including at least one flat turn, the axis of which is parallel to a pipe holding plasma, consisting of an annular section with a narrow rupture and flat current-supplying contacts connected to both halves of the annular section of the inductor at the place of its rupture, different in that, in order to provide more uniform distribution of a plasma temperature in the plane of turns, flat current-supplying contacts are connected to the annular section of the inductor perpendicular to its plane and symmetrically on both sides of the plane of the inductor. According to the second option of the inductor, flat turns composing it have a possibility of mutual movement along the axis of the inductor without breaking of an electrical connection of their contacts to an electromagnetic oscillation source, which provides a possibility of control of temperature fields in a plasma volume. Examples of improvement of uniformity of a plasma temperature, when using the claimed inductor, and increase in controllability of a plasma flow are given.

EFFECT: obtaining stable inductively coupled plasma with controlled temperature fields.

2 cl, 10 dwg