FIELD: processing of metal bases for cold forming.
SUBSTANCE: base is preferably sequentially cleaned and rinsed, preferably etched and rinsed, brought into contact with an acidic, reactive water-based lubricant. The substance contains oxalic acid, at least one accelerating additive and at least one film-forming substance, at least one wax and/or at least one emulsified lubricating oil. At least one film-forming substance is selected from the group consisting of homopolymers and copolymers of ethylene, propylene, styrene, (meth)acrylic acid, (meth)acrylate, vinylamine, vinylformamide, vinylpyrrolidone, vinylcaprolactam, vinylacetate, vinylimidazole and/or epoxide and their salts and polyurethanes, polyamides, polyethylenimines, polyamines and their salts. At least one wax is selected from the group consisting of non-ionic waxes and cationic-stabilized waxes.
EFFECT: result is a reduction in the processing stages of metal substrates.
16 cl, 7 tbl, 1 ex
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