RADIATION-RESISTANT PANCRATIC LENS Russian patent published in 2024 - IPC G02B15/16 

Abstract RU 2815752 C1

FIELD: optoelectronic instrument making.

SUBSTANCE: invention relates to optoelectronic instrumentation, namely to systems with variable focal distance used in various optical devices operating in conditions of high radiation background. Lens consists of four successively arranged components: the first is positive, the second is negative, the third is negative and the fourth is positive. First component 1 comprises two gluings and three single lenses and acts as a movable focusing unit. Second component 2 is movable and comprises one gluing and two single lenses. Third component 3 is movable and consists of one gluing. Fourth component 4 is fixed and comprises three gluings and three single lenses. Aperture diaphragm 5 is located between the third and fourth components. Providing a difference in focal distances from 12 to 120 mm while maintaining the position of the image plane, high quality of the optical image, as well as the possibility of operating under conditions of exposure to gamma radiation with power of up to 5×106 rad/h.

EFFECT: reduction in the size of the lens while maintaining high image quality and the possibility of operating under conditions of exposure to gamma radiation with power of up to 5×106 rad/h.

1 cl, 4 dwg

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RU 2 815 752 C1

Authors

Shemigon Tatyana Nikolaevna

Dobryakov Boris Nikolaevich

Mikhajlovskij Artur Igorevich

Denisov Andrej Vasilevich

Zimin Vladimir Arkadevich

Dates

2024-03-21Published

2024-01-09Filed