FIELD: light-sensitive materials. SUBSTANCE: composition containing photoconductive polyimide with general formula
, where n= 10-500, x is -CO-, -SO2- or -C(CH3)2, and solvent is distinguished by that, as solvent, pyridine, aniline, N,N-dimethylaniline, or their mixture is used, polyimide concentration being 5-10 wt %. EFFECT: improved quality of material due to increased light sensitivity and/or reduced dark drop of potential and/or by positive or negative charging.
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC MATERIAL FOR MICROFILMING | 1985 |
|
SU1324476A1 |
| ELECTROPHOTOGRAPHIC MATERIAL | 1983 |
|
SU1141898A1 |
| COMPOSITION OF SENSITIVE LAYER OF ELECTOPHOTOGRAPHIC MATERIAL | 1985 |
|
SU1360403A1 |
| ELECTROPHOTOGRAPHIC MATERIAL | 1984 |
|
SU1220482A1 |
| SOLUBLE PHOTOCONDUCTING POLYIMIDES | 1996 |
|
RU2124530C1 |
| PHOTOCONDUCTING LAYER | 1996 |
|
RU2120652C1 |
| COPOLYMERS OF ETHERS OF METHACRYLIC ACID AS SENSITIZERS OF ELECTROGRAPHIC LAYERS BASED ON POLYETHOXYPROPYLCARBAZOLE | 0 |
|
SU1613995A1 |
| ELECTROPHTOGRAPHIC MATERIAL | 1980 |
|
SU893034A1 |
| ELECTROPHOTOGRAPHIC MATERIAL | 1984 |
|
SU1190780A1 |
| ELECTROPHOTOGRAPHY MATERIAL | 0 |
|
SU1506430A1 |
Authors
Dates
1998-10-27—Published
1984-04-04—Filed