FIELD: light-sensitive materials. SUBSTANCE: sensitive layer containing sensitizer and polyimide with general formula , where n= 10-500 and X is oxygen, carbonyl, sulfone group, or isopropyl, is applied on conducting support. Sensitive layer is then covered with fixed layer from solution of polymer, selected from the following group: butyl methacrylate/methacrylic acid copolymer, polyvinylbutyral, polyvinyl alcohol, in methyl ethyl ketone or ethanol at polymer to solvent weight ratio (3.0-9.5):(90.5-97.0) and viscosity of solution 3.1-34.0 centistoke. Finally, layer is dried at 60-65 C. EFFECT: improved quality of material because of reduced dark drop of potential and increased strength of image fixation. 2 tbl
Title | Year | Author | Number |
---|---|---|---|
LIGHT-SENSITIVE COMPOSITION FOR ELECTROPHOTOGRAPHIC MATERIAL | 1984 |
|
SU1210584A1 |
ELECTROPHOTOGRAPHIC MATERIAL | 1983 |
|
SU1141898A1 |
ELECTROPHTOGRAPHIC MATERIALS | 1984 |
|
SU1194178A1 |
COMPOSITION FOR LIGHTENING ELECTROPHOTOGRAPHIC IMAGE ON ORGANIC PHOTOCONDUCTOR | 0 |
|
SU1444700A1 |
COMPOSITION OF SENSITIVE LAYER OF ELECTOPHOTOGRAPHIC MATERIAL | 1985 |
|
SU1360403A1 |
PHOTOCONDUCTING LAYER | 1996 |
|
RU2120652C1 |
ELECTROPHOTOGRAPHIC MATERIAL | 1984 |
|
SU1190780A1 |
ELECTROPHOTOGRAPHIC MATERIAL | 0 |
|
SU972467A1 |
ELECTROPHOTOGRAPHIC MATERIAL PHOTOCONDUCTIVE LAYER | 1980 |
|
SU917635A1 |
ELECTROPHTOGRAPHIC MATERIAL | 1980 |
|
SU893034A1 |
Authors
Dates
1998-10-27—Published
1985-05-12—Filed