FIELD: computer engineering. SUBSTANCE: clearance buses are located over all information buses under floating silicon electrodes. In addition, field-effect transistors are connected to each information bus instead of a single information bus. This results in possibility to exclude injection of hot electrons from channel of storing transistor that was no selected. This is caused by voltage drop of open address field-effect transistor while capacitor is charged. As result, threshold voltage of storing transistor that was not selected is not changed. EFFECT: increased reliability. 1 dwg
Title | Year | Author | Number |
---|---|---|---|
MATRIX STORAGE CIRCUIT FOR PERMANENT STORAGE | 1986 |
|
SU1385872A1 |
MATRIX STACKER FOR PERMANENT STORAGE | 1980 |
|
SU888731A1 |
MATRIX ACCUMULATOR FOR READ-ONLY MEMORY UNIT | 1982 |
|
SU1108915A1 |
METHOD OF MATRIX STORAGE FABRICATING FOR FIXED MEMORY | 0 |
|
SU1628735A1 |
MATRIX MEMORY FOR PERMANENT STORAGE | 1983 |
|
SU1105055A1 |
MATRIX STORAGE CIRCUIT OF PERMANENT STORAGE | 1986 |
|
SU1378682A1 |
MATRIX STACKER FOR PERMANENT STORAGE | 1981 |
|
SU1025259A1 |
MEMORY CELL FOR FIXED STORAGE AND IT MAKING METHOD | 0 |
|
SU1655242A1 |
STORAGE UNIT FOR FIXED MEMORY AND METHOD FOR IT FABRICATING | 0 |
|
SU1642888A1 |
STACKER FOR PERMANENT STORAGE | 1982 |
|
SU1053638A1 |
Authors
Dates
1995-12-20—Published
1986-01-21—Filed