FIELD: production of photographic materials. SUBSTANCE: method for production of photopolymerized composition for protective reliefs includes two-stage condensation, first, 100 mas.p. of epoxy resin with 18.7-50 mas.p. of adipic acid in the presence of 5-8 mas.p. of Michler's ketone with CrCl3 (ratio 10.0:1); 150 mas.p. of epichlorohydrin and 0.3-1 mas.p. of hydroquinone, and then, condensation of epichlorohydrine and methacrylic acid (160-264 mas. p.). First stage lasts for 50-60 min at 100 C and the second stage conducted at 95-105 C lasts up to attainment of acid number of 0.2-12 mg KOH/kg and epoxy number of 0.11-1.2 mas.%. Epoxy resin is used in form of mixture of epoxides with formulas I and II indicated in invention description. In this case, mixture of formula I has mol.wt of 340 and content of epoxy groups of 25.3 mas.%; and mixture formula 11 has mol.wt of 624 and content of epoxy groups of 13.8 mas.% with mass ratio of 2.5:1. EFFECT: increased photosensitivity of composition by 31.5-66.7% with reduced duration of process from 10-15 to 6-8 h and higher efficiency. 1 tbl
Title | Year | Author | Number |
---|---|---|---|
METHOD OF PRODUCING PHOTO-POLYMERIZING COMPOSITIONS FOR PROTECTING RELIEFS | 1985 |
|
SU1259846A1 |
PHOTO-POLYMERIZING COMPOSITION FOR DRY FILM PHOTORESISTOR | 1985 |
|
SU1289237A1 |
DRY-FILM PHOTORESIST | 1985 |
|
SU1311456A1 |
METHOD FOR PRODUCTION OF PHOTOPOLARIZED COMPOSITION | 1987 |
|
SU1498261A1 |
METHOD OF PRODUCING PHOTOPOLYMERIZING COMPOSITION | 0 |
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SU1144085A1 |
PHOTOPOLYMERIZED COMPOSITION | 1988 |
|
SU1584607A1 |
METHOD OF PREPARING OF PHOTOPOLYMERIZING COMPOSITION | 1986 |
|
SU1519194A1 |
DRY FILM PROTORESIST MATERIAL | 0 |
|
SU941918A1 |
PHOTOPOLYMERIZING COMPOSITION FOR DRY FILM PHOTORESIST | 1985 |
|
SU1295930A1 |
METHOD OF OBTAINING PHOTOPOLYMERISABLE COMPOSITION | 0 |
|
SU769480A1 |
Authors
Dates
1995-04-20—Published
1986-09-22—Filed