DRY-FILM PHOTORESIST Russian patent published in 1995 - IPC

FIELD: photoresists. SUBSTANCE: dry-film photoresist contains additives of dicarboxylic acids and besides photoinitiator, some other components. Photoresist contains the following components, mas.p.: film-forming polymer 80-120; photoinitiator 3-15; cross-linking acrylic monomer 30-90; dye 0.05-0.3; inhibitor 0.005-0.3; polar agent 8-22; monounsaturated hydroxy-containing monomer 10-40; and dicarboxylic acid 0.05-0.5. Used as film-forming polymer is polymethyl methacrylate with mol.wt of (4-9)10⁴ or copolymer of methyl methacrylate (98 mas.%) with methyl acrylate (2 mas.%) with mol.wt of (8-12)10⁴ or styrene copolymer (50 mas.%) with mono-n-butyl ether of maleic acid (50 mas.%) with mol.wt of (1-2.5)10⁴ methyl methacrylate copolymer (70 mas.%) with methylmetacrylic acid (30 mas.%) with mol.wt of (1.3-3.2)10⁴. Cross-linking acrylic monomer is used in form of dimethacrylate-bis(ethylene glycol)phthalate or its mixture with triethyleneglycol (mass ratio 1:1), or pentaerythritol triacrylate or pentaerythritol diacrylatemonomethacrylate, or trimethylol propane trimethacrylate. Dyes - basic blue K (Victoria light blue) C. I. No.44040; methyl violet C.I. No.42535; basic green I C.I. No.42040; Victoria pure light blue C.I. No.42595; crystalline violet C. I. No.42555. Inhibitor-hydroquinone or its monomethyl ether, Bisalkophen, phenothiazine or quinhydrone. Polar agent is in form of compound with formula given in invention description. Dicarboxylic acids are used in form of succinic, glutaric, adipic or sebacic acid. EFFECT: higher stability of photoresist in media of boron-hydrogen electrolytes and increased adhesion to copper substrate. 2 tbl