PHOTOPOLYMERIZING COMPOSITION FOR DRY FILM PHOTORESIST Russian patent published in 1995 - IPC

FIELD: photopolymeric compositions. SUBSTANCE: method involves the use of components: film-forming substance, inhibitor, dye, solvent, polyester. Photopolymerizing composition has, mas. p. film-forming substance polymethylmethacrylate with molecular mass (4-9) x 4-9·10⁴ or copolymer of styrene with maleic acid mono-n-butyl ester (50:50 mol.) with molecular mass (1.6-2.8) x 1,6-2,8·10⁴ 80-120; dimethacrylate-bis-(ethylene glycol)phthalate 60-100; photoinitiating agent a mixture of benzophenone and 4,4,4′-bis-(dimethylamino)benzophenone at mass ratio (2-9):1 3-9; inhibitor hydroquinone, p-methoxyphenol or bisalkophene 0.005-0.15; dye basic blue K C.J. number 44040 or Victoria pure blue C.J. number 42595, or basic green I C.J. number 42040 0.05-0.25; solvent - methylene chloride or a mixture of acetone with n-butanol (at mass ratio 3: 1) 150-600; polyester of the general formula where n 3-5, content of hydroxyl-groups is 4.9-7.8 wt.-% molecular mass is 650-1040 8-25. Minimally reproducible line is 80-90 mcm, stability in acid medium is up to 2.75 h, average width of air distance between backing relief bands is 7.4 mcm, degree of nonfilling between backing relief bands is up to 2.5% as compared with 120; 1.25; 43.8 and 14.6, respectively. EFFECT: increased resolution capability, resistance in acid medium and improved rheological properties. 2 tbl