FIELD: computer engineering. SUBSTANCE: fourth diffusion region of first type of conductance with dope concentration 1014-5·1015cm-3 is injected into layer close to surface of semiconductor substrate. Inclusion of this region leads to decrease of threshold voltage. Chosen concentration provides for symmetry of characteristics, i.e. for equal values of threshold voltages "0" and "1". EFFECT: enhanced reliability of storage circuit due to reduction of probability of single failures when re-programming. 5 dwg
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Authors
Dates
1994-12-30—Published
1987-03-05—Filed