PULSED ELECTRON-EMITTING SOURCE Russian patent published in 1995 - IPC

FIELD: heavy-current electronics. SUBSTANCE: current pick-off of electron beam is accomplished from the bound of the plasma surface of creeping discharge moving on the dielectric towards the anode. The direction of motion of cathode plasma coincides with the direction of field lines of the electric field by which the electron beam is withdrawn. The pulsed electron-emitting source consists of the following major components: vacuum chamber 1, high-voltage bushing insulator 2, cathode current tap 3, current tap 4, cathode 5, dielectric plate 6, anode 7, high-voltage impulse generator, plasma jet 9, electron beam 10. EFFECT: enhanced efficiency attained by generation of shaped electron beams. 10 dwg