FIELD: gas-discharge engineering. SUBSTANCE: device has two electrodes 1 disposed one relatively the other at constant distance. Cathode holder 4 and substrates 3 are disposed between the electrodes. Feed of discharge is carried out from ac supply. Configuration of electrodes 1 described in the invention and method of energizing equalize averaging of plasma concentration distribution which determines uniformity and speed of treatment. Development of surfaces of electrodes due to cups 2 brought into the construction, permits to improve power of discharge and productivity of treatment. Potentials of the cathodes are set by d. c. voltage supply relatively the vacuum chamber which results to maintain specific values of bias voltage and potential of the cathodes relatively plasma potential in the area of treatment. EFFECT: improved productivity; improved quality of coatings. 2 cl, 1 dwg
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Authors
Dates
1994-03-30—Published
1990-04-17—Filed