METHOD OF PREPARING PHOTOSENSITIVE COMPOSITION FOR ELECTROPHOTOGRAPHIC MATERIAL Russian patent published in 1995 - IPC

FIELD: chemical-photographic industry. SUBSTANCE: method involves oligomerization of epoxy monomer of the general formula where R - or ; (R₁=R₂=H, Br, Cl; R₃=H, Br) in the presence of 3-10 mol.% oligomerization initiating agent - boron trifluoride etherate in methylene chloride at 40±2 C up to formation of oligomer of the general formula where n = 3-6, and R - as indicated above following by addition of 0.1-10.0 mol.% β-diketone of the general formula R′-CO-CH₂-CO-R″ where R′ and R″ - 4-tolyl, 4-methoxyphenyl, 4-butoxyphenyl, 2,4-dimethoxyphenyl, 2,3,4-trimethoxyphenyl, or β-oxyketone of the general formula (IV) where R′+R″′ - naphtho-1,2-residue, 4-methoxybenzo-1,2-residue, ; R′=CH₃; (R″′-OCH₃, OC₄H₉) which form with boron trifluoride excess boron-chelate complex (V) where R′, R″ и R″′ have the same meanings as in formulas III and IV. X - fluorine or terminal fragment of oligomer. The following isolation of the end product is carried out by liquid phase distillation off. EFFECT: improved method of composition preparing. 4 tbl