DEVICE FOR RECORDING DEVELOPMENT PHASES OF WAVE AND CURRENT SURFACE DISCHARGE STRUCTURES Russian patent published in 1995 - IPC

FIELD: physical facilities for analyzing gas discharges. SUBSTANCE: device has high-voltage electrode 1, grounding electrode 2, both mounted on insulating substrate 3, and photorecording optical system 7 mounted above effective surface of substrate. High-voltage electrode is connected via switch 5 to voltage source and to first lead of energy storage capacitor 4 whose second lead is connected to grounding electrode 2. Matching resistor 6 inserted between high-voltage and grounding electrodes has resistance value R for incomplete stage of discharge found from equation , where L is discharge circuit inductance; C is energy storage capacitor value; C_g is distributed capacitance of insulating substrate 3 carrying recording layer; for completer stage of discharge resistance R is found from equation , where R_п is ohmic resistance of plasma channels. EFFECT: improved informative capacity due to shaping of aperiodic-waveform high-voltage pulse. 1 dwg