ELECTRON-BEAM INSTALLATION Russian patent published in 1995 - IPC

Abstract RU 2032258 C1

FIELD: electronic equipment. SUBSTANCE: electron-beam installation has at least one CRT incorporating envelope with base and current leads, electron gun with cathode and gate electrodes, and active component, high-voltage source for cathode, at least one modulating pulse shaper for electron beam current placed inside conducting envelope; the latter has at least one hole; some portion of envelope surface on electron gun side is partially introduced through hole inside envelope, furnished with high-resistance coating brought in electric contact with cathode lead on base side and grounded on active component side. EFFECT: simplified design of high-voltage insulation from high-voltage power supply and functional electronic units. 10 cl, 2 dwg

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RU 2 032 258 C1

Authors

Sadchikhin A.V.

Katsap V.N.

Tsygankov V.V.

Dates

1995-03-27Published

1992-09-28Filed