FIELD: analysis of materials. SUBSTANCE: process provides for such orientation of transparent stone in field of vision of amplifying device that pattern of flaw is seen through its flat face and measurements of parameters determining its position, in particular, angle between faces of transparent stone, distances between patterns of flaw and finding of its position depending on measured parameters are possible. EFFECT: enhanced authenticity of determination of flaws. 1 dwg
Title | Year | Author | Number |
---|---|---|---|
METHOD FOR DETERMINING DEFECT POSITION IN TRANSPARENT STONE | 1993 |
|
RU2054656C1 |
METHOD FOR MAKING DIAMOND TIPS | 1992 |
|
RU2024397C1 |
LASER SCREEN OF CATHODE-RAY TUBE | 1992 |
|
RU2042227C1 |
DIFFRACTION-MEASURING METHOD FOR DETECTION OF CRYSTAL-AXES ORIENTATION IN BIG SINGLE-CRYSTAL OF KNOWN STRUCTURE | 1993 |
|
RU2085917C1 |
METHOD OF MEASUREMENT OF REFRACTIVE INDEX OF TRANSPARENT AND ABSORBING MEDIA | 1994 |
|
RU2065148C1 |
DISCRETE OPTICAL LEVEL METER | 1991 |
|
RU2014572C1 |
METHOD OF CREATING SIGNATURE FOR GEMSTONE USING X-RAY IMAGING | 2015 |
|
RU2690707C2 |
METHOD OF INSPECTING TRANSPARENT OPTIC ARTICLES | 0 |
|
SU1800261A1 |
PRISM TO ROTATE IMAGE | 1993 |
|
RU2075766C1 |
Authors
Dates
1995-05-10—Published
1992-05-26—Filed